EDI2000

The EDI2000 system is designed for a final product water output of 2 m³/h, with a product water resistivity of ≥15 MΩ·cm​ at 25°C. It primarily consists of a pre-treatment system, reverse osmosis (RO) system, EDI polishing system, mixed-bed system, and a control system. This system is suitable for applications with stringent water quality requirements, such as electronic semiconductor packaging, laboratory analysis, pharmaceutical preparation, fine chemicals, SIP cleaning, and PCBA cleaning .

Technical Features

1. 24/7 automatic operation with continuous water production.

2. 2-stage RO + EDI + resin process.

3. Ultra-pure water quality, meeting the high cleanliness requirements of semiconductor products.

4. The produced water maintains a long-term stable resistivity of ≥15 MΩ·cm (at 25℃).

5. Automatic detection for all components, automatic operation protection, and low energy consumption.

6. Both control and water production components are integrated into a single frame, facilitating transportation and installation.

7. Modular design enables easier subsequent maintenance and replacement of consumables.

8. Water recovery rate of 50%.

9. Compatible with our company’s in-line PCBA cleaning machines and semiconductor packaging cleaning machines.